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The national standard for direct-write lithography technology led by CFMEE is officially implemented
Release time:
2024-09-30
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At present, direct writing lithography equipment is widely used and developed in the field of PCB and pan-semiconductor, becoming an emerging micro-nano processing equipment, but there is a lack of national standards for direct writing lithography equipment in the micro-nano processing industry equipment industry. Direct writing lithography technology has significant advantages, such as digital mask design, no need for traditional mask plates, reducing production costs; simplifying process flow, greatly reducing production cycle; improving product yield by reducing process steps; and easy to achieve intelligent management and control, providing strong support for the construction of fully automatic unmanned factories.
In the face of the current booming market of PCB and IC packaging substrate direct writing exposure equipment and the rapid changes in technology, this national standard aims to fill the gap in industry standards and set unified and scientific technical rules for the entire life cycle of equipment design, manufacturing, testing, installation and maintenance, quality inspection and assurance, so as to build a complete set of system standards for the industry.
In the process of standard formulation, CFMEE fully utilized its own technical research and development strength and rich practical experience, actively led and participated in the discussion, research and verification work at all stages, and strived to ensure the scientific rationality, wide range of application and foresight of future technological development of the standard.
CFMEE will continue to uphold a rigorous and pragmatic attitude and strictly implement all work in accordance with the new standard. As the main drafter of this national standard, it will actively promote the implementation of the industry's enterprises. Please pay attention to our dynamics in implementing the new national standard.
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