LDW 350/500 Direct Writing Lithography System
The system is based on the advanced DLP digital lithography technology, adopts high-precision precision motion platform, optical system, microenvironment control system, and has real-time auto focusing, automatic centering and other functions.
Product Features
01
Minimum lines & spaces:
350nm
01
Overlay [3σ]
±150nm
*The above data is derived from the test results of CFMEE laboratory, and the specific situation may vary depending on the actual use environment. The company reserves the right to adjust the relevant data and content without prior notice.
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