MLC 600 Direct Writing Lithography System Series
This device utilizes advanced digital lithography technology, allowing it to directly, without mask, transfer designed pattern on the substrates with photosensitive material. The system is flexible, compact, and cost-effective, specifically designed for universities, laboratories, and research institutions. Its main applications include the fabrication of various MEMS devices (such as MEMS microphones, pressure sensors, accelerometers, gyroscopes, ultrasonic sensors, piezoelectric sensors, etc.), as well as photomask making.
Product Features
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Compact design
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Applied for MEMS, power module, etc.
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Auto alignment, back side alignment, user defined alignment mark
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Automatic real-time auto focusing
*The above data is derived from the test results of CFMEE laboratory, and the specific situation may vary depending on the actual use environment. The company reserves the right to adjust the relevant data and content without prior notice.
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