NEX 30 Series
ICS
SLP
Product Features
01
The benchmark for solder mask DI

01
Applied in IC substrate and SLP solder mask process

01
Minimal 30μm DAM and 50μm SRO

01
Auto focus up to ±200μm

01
Dual-table platform achieves alignment accuracy down to ±7μm with high productivity

01
Throughput up to 120 panels/hour (one line, dual table)

*The above data is derived from the test results of CFMEE laboratory, and the specific situation may vary depending on the actual use environment. The company reserves the right to adjust the relevant data and content without prior notice.
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