Related News
2024.09.30
The national standard for direct-write lithography technology led by CFMEE is officially implemented
2024.09.05
CFMEE won the 11th Anhui Province Patent Gold Award
2024.08.30
Congratulations on the topping out of the second phase of the CFMEE Project
2024.08.19
CFMEE's power device direct writing lithography equipment exported to Japan
CFMEE's power device direct writing lithography equipment exported to Japan
Release time:
2024-08-19
Read
CFMEE, a leading manufacturer of direct writing lithography equipment in China, exported its MLF series equipment to Japan for the first time.
The MLF series direct writing lithography equipment is designed for high-precision and high-efficiency packaging applications, such as the packaging process of insulated gate bipolar transistors (IGBTs). The equipment is equipped with an advanced equipment front-end module (EFEM), which can support the fully automatic operation process of 12-inch wafers, significantly improving production efficiency and process consistency. CFMEE will provide technical support and services to Japanese customers throughout the process to ensure efficient and stable operation of the equipment.
This export marks a solid step forward for CFMEE in its globalization strategy, further consolidating its leading position in the field of direct writing lithography equipment.
