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Congratulations on the topping out of the second phase of the CFMEE Project
Release time:
2024-08-30
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On August 30, the construction project of the second phase of the CFMEE plant was successfully capped.
The second phase of the CFMEE project is located at the intersection of Changning Avenue and Chang'an Road. The project is mainly used to deepen the application of direct writing lithography equipment industry, industrialize IC substrates and substrate-like direct writing lithography equipment, and independently develop key subsystems and core components. The total construction area of the second phase project is 40,397.93 square meters, of which the modern clean workshop is more than 20,000 square meters, which is more than 2.5 times the area of the clean workshop in the current first phase.
The second phase of the plant is expected to be completed and put into production in mid-2025. By then, the first and second phases will be integrated into an integrated R&D and production capacity delivery center, providing strong support for the long-term and stable development of CFMEE in the future.
