LDW-RTR 25DE Double-sided Direct Writing Lithography System
Using DMD technology, the system can achieve a minimum of 25μm fine line and excellent line width uniformity and edge roughness through high-precision data resolution, which can reduce the overall cost while ensuring the high quality.
Product Features
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Maskless direct-write lithography
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Automatic alignment
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High Throughput by double-sided exposure
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Air shaft for roll loading
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Various data format（GDSⅡ/Gerber/ODB++）
*The above data is derived from the test results of CFMEE laboratory, and the specific situation may vary depending on the actual use environment. The company reserves the right to adjust the relevant data and content without prior notice.
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